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Volumn 178, Issue 1-2, 1997, Pages 174-188

Thermodynamical properties of III-V nitrides and crystal growth of GaN at high N2 pressure

Author keywords

AlN; GaN; Homoepitaxy; InN; Solution crystal growth; Thermodynamics

Indexed keywords

CRYSTAL GROWTH; CRYSTALLIZATION; HIGH PRESSURE EFFECTS; MELTING; NITRIDES; NUCLEATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SINGLE CRYSTALS; SOLUBILITY; THERMODYNAMIC STABILITY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR BEAM EPITAXY; SEMICONDUCTOR GROWTH; SOLUTIONS;

EID: 0031150309     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00072-9     Document Type: Article
Times cited : (184)

References (37)
  • 6
    • 30244546905 scopus 로고
    • Contract Rep. NASA-Cr-1171
    • W. Class, Contract Rep. NASA-Cr-1171 (1968).
    • (1968)
    • Class, W.1
  • 15
    • 30244482017 scopus 로고    scopus 로고
    • High pressure science and technology
    • Ed. W. Trzeciakowski World Scientific, Singapore
    • I. Grzegory, High Pressure Science and Technology, Proc. Joint XV AIRAPT and XXXV EHPRG Conf. Ed. W. Trzeciakowski (World Scientific, Singapore, 1996) p. 14.
    • (1996) Proc. Joint XV AIRAPT and XXXV EHPRG Conf. , pp. 14
    • Grzegory, I.1
  • 36
    • 30244460660 scopus 로고    scopus 로고
    • private communication
    • M. Bockowski, private communication.
    • Bockowski, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.