Test structures to measure the seebeck coefficient of CMOS IC polysilicon

IEEE Transactions on Semiconductor Manufacturing

Volumn 10, Issue 2, 1997, Pages 201-208

  Von Arx, M ^b   Paul, O ^a,b   Baltes, Henry ^a,b  

^a IEEE

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING; THERMOELECTRICITY; THIN FILMS;

POLYSILICON FILMS; SEEBECK COEFFICIENT;

TRANSDUCERS;

EID: 0031142859     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.572069     Document Type: Article

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