Thermal sensors fabricated by CMOS and micromachining

Sensors and Materials

Volumn 8, Issue 6, 1996, Pages 409-421

  Baltes, Henry ^a   Paul, Oliver ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

CMOS; Flow sensor; Infrared sensor; Micromachining; Power sensor; Pressure sensor; Thermal material properties

Indexed keywords

EID: 20544470163     PISSN: 09144935     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

1. H. Baltes, O. Brand, J. G. Korvink, R. Lenggenhager and O. Paul: ESSDERC '94, ed. C. Hill, P. Ashburn (Editions Frontières, Gif-sur-Yvette, 1994) p. 273.
2. H. Baltes and R. Castagnetti: Magnetic Sensors, Semiconductor Sensors, ed. S. Sze (Wiley, New York, 1994) p. 205.
3. C. Cornila, R. Lenggenhager, P. Malcovati, H. Baltes, A. Hierlemann, G. Noetzel, U. Weimar and W. Göpel: Fifth Internat. Meeting on Chemical Sensors, Tech. Digest (University of Rome, Rome, 1994) p. 450.
4. H. Baltes: Sensors and Actuators A 37-38 (1993) 51.
5. D. Moser: CMOS Flow Sensors, Ph. D. Thesis (ETH Zurich, Zurich, 1993).
6. R. Lenggenhager: CMOS Thermoelectric Infrared Sensors, Ph. D. Thesis (ETH Zurich, Zurich, 1994).