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Volumn 175-176, Issue PART 1, 1997, Pages 387-392
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Improving the etched/regrown GaAs interface by in-situ etching using tris-dimethylaminoarsenic
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CAPACITANCE MEASUREMENT;
CHARGE CARRIERS;
CHEMICAL BEAM EPITAXY;
ETCHING;
MORPHOLOGY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SUBSTRATES;
SURFACE ROUGHNESS;
THERMAL EFFECTS;
VOLTAGE MEASUREMENT;
CAPACITANCE VOLTAGE CHARACTERISTICS;
SEMICONDUCTOR JUNCTIONS;
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EID: 0031140999
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(96)00827-5 Document Type: Article |
Times cited : (6)
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References (22)
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