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Volumn 175-176, Issue PART 1, 1997, Pages 387-392

Improving the etched/regrown GaAs interface by in-situ etching using tris-dimethylaminoarsenic

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITANCE MEASUREMENT; CHARGE CARRIERS; CHEMICAL BEAM EPITAXY; ETCHING; MORPHOLOGY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EFFECTS; VOLTAGE MEASUREMENT;

EID: 0031140999     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00827-5     Document Type: Article
Times cited : (6)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.