FMR, XRD and XHRTEM characterization of stresses in an epitaxial Ni-Cu film prepared on MgO(001) by d.c. biased plasma sputter deposition

Thin Solid Films

Volumn 299, Issue 1-2, 1997, Pages 59-62

  Maruyama, Hiroko ^a   Qiu, Hong ^b   Hashimoto, Mituri ^b   Fudaba, Kazuyoshi ^b   Nakai, Hisashi ^b   Barna, Arpad ^c   Barna, Peter B ^c  

^a TOYO UNIVERSITY   (Japan)

^b UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

^c RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Elastic properties; Epitaxy; Sputtering; Stress

Indexed keywords

EPITAXIAL GROWTH; FERROMAGNETIC RESONANCE; NICKEL ALLOYS; PLASMA SPRAYING; SPUTTER DEPOSITION; STRESSES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PLASMA SPUTTERING; X RAY REFLECTION DIFFRACTION;

METALLIC FILMS;

EID: 0031130509     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09394-7     Document Type: Article

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