Surfactant effect of hydrogen for nickel growth on Si(111)7 × 7 surface

Surface Science

Volumn 357-358, Issue , 1996, Pages 910-916

  Murano, K ^a   Ueda, K ^b  

^a OSAKA UNIVERSITY   (Japan)

^b TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Desorption induced by electronic transitions (DIET); Electron stimulated desorption (ESD); Hydrogen; Low energy electron diffraction (LEED); Nickel; Silicides; Silicon; Surface diffusion

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DESORPTION; DIFFUSION IN SOLIDS; EPITAXIAL GROWTH; HYDROGEN; HYDROGENATION; LOW ENERGY ELECTRON DIFFRACTION; METALLIC FILMS; NICKEL; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; SURFACE ACTIVE AGENTS;

ATOMIC HYDROGEN; DESORPTION INDUCED BY ELECTRONIC TRANSITIONS; ELECTRON STIMULATED DESORPTION; FRANK VAN DER MERWE GROWTH MODE; SILICIDES; STRANSKI-KRASTANOV MODE; SURFACE DIFFUSION; TIME OF FLIGHT TYPE ELECTRON STIMULATED DESORPTION;

SURFACE PHENOMENA;

EID: 13544250095     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00290-7     Document Type: Article

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