Anisotropic etching of a novalak-based polymer at cryogenic temperature

Journal of the Electrochemical Society

Volumn 144, Issue 3, 1997, Pages 1008-1013

  Hsiao, R ^a   Yu, K ^b   Fan, L S ^a   Pandhumsopom, T ^b   Sanitini, H ^a   Macdonald, S A ^a   Robertson, N ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYOGENICS; PHOTOSENSITIVITY; PLASMA ETCHING; PRESSURE EFFECTS;

ANISOTROPIC ETCHING; NOVALAK PHOTOSENSITIVE POLYMER;

POLYMERS;

EID: 0031098049     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837521     Document Type: Article

References (17)

1. R. S. Hutton, S. M. Stein, C. H. Boyce, D. R. Wheeler, R. A. Cirelli, F. A. Baiocchi, J. Kovalchick, and G. N. Taylor, J. Vac. Sci. Technol., B12, 3919 (1994).
2. R. S. Hutton, C. H. Boyce, and G. N. Taylor, ibid., B16, 422 (1995).
3. J. Vertommen and A. M. Goethals, in Proceedings of the Semicon West Lam Research Technical Symposium, San Francisco, CA (1995).
4. M. Pons, J. Pelletier, and O. Joubert, J. Appl. Phys., 75, 4709 (1994).
5. K. Murakami, Y. Wakabayashi, K. Minami, and M. Essashi, IEEE, Proc. Vol., 0-7803-0957, p. 65, IEEE (1993).
6. K. T. Sung, W. H. Huan, S. W. Pang, and M. W. Horn, This Journal, 140, 3620 (1993).
7. W. Varhue and J. Burroughs, J. Appl. Phys., 72, 3050 (1992).
8. S. C. Palmateer, A. R. Forte, R. R. Kunz, and M. W. Horn, J. Vac. Sci. Technol., A14, 1132 (1996).
9. J. Etrillard, J. Francou, A. Inard, and D. Henry, Jpn. J. Appl. Phys., 33, 6005 (1994).
10. S. E. Bernacki and B. B. Kosicki, This Journal, 131, 1926 (1984).
11. D. R. McKean, T. R. Russel, W. D. Hinsberg, D. Hofer, and A. F. Renaldo, J. Vac. Sci. Technol., B13, 3000 (1996).
12. M. Puech and Ph. Maguin, Appl. Surf. Sci., 100, 579 (1996).
13. Y. Ra and C. Chen, J. Vac. Sci. Technol., A11, 2911 (1993).
14. J. H. Keller, J. C. Forster, and M. S. Barnes, ibid., A11, 2487 (1993).
15. H. Gokan, S. Esho, and Y. Ohnishi, This Journal, 130, 143 (1983).
16. S. Murakawa and J. P. McVittie, Appl. Phys. Lett., 64, 1558 (1994).
17. R. Legtenberg, H. Jansen, M. D. Boer, and M. Elwenspoek, This Journal, 142, 2020 (1995).