Thick film positive photoresist: development and resolution enhancement technique

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 6, 1995, Pages 3000-3006

  McKean, Dennis R ^a   Russell, Thomas P ^a   Hinsberg, William D ^a   Hofer, Don ^a   Renaldo, Alfred F ^a   Grant Wilson, C ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC COMPOUNDS; ASPECT RATIO; ELECTROPLATING; OPTICAL RESOLVING POWER; ORGANIC POLYMERS; ORGANIC SOLVENTS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SURFACE ACTIVE AGENTS; SURFACE TREATMENT; THICK FILMS; TRANSPARENCY;

BLEACHABILITY; CETYLTRIMETHYLAMMONIUM SULFATE; DIAZONAPHTHOQUINONE; ETHYL LACTATE; NOVOLAC RESIN; PROCESS LATITUDE; SURFACTANT SURFACE TREATMENT;

PHOTORESISTS;

EID: 0029405265     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588295     Document Type: Article

References (11)