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Volumn 44, Issue 2, 1997, Pages 343-345

A temperature-dependent MOSFET inversion layer carrier mobility model for device and circuit simulation

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC FIELD EFFECTS; ELECTRIC FIELDS; ELECTRONS; SEMICONDUCTOR DEVICE MODELS; SIMULATION; THERMAL EFFECTS;

EID: 0031078964     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.557730     Document Type: Article
Times cited : (23)

References (9)
  • 5
    • 0020186076 scopus 로고    scopus 로고
    • Charge accumulation and mobility in thin dielectric MOS transistors
    • 28, pp. 833-841, Sept. 1982.
    • C. G. Sodini, T. W. Ekstedt, and J. L. Moll, "Charge accumulation and mobility in thin dielectric MOS transistors," IEEE Trans. Electron Devices, vol. ED28, pp. 833-841, Sept. 1982.
    • IEEE Trans. Electron Devices, Vol. ED
    • Sodini, C.G.1    Ekstedt, T.W.2    Moll, J.L.3
  • 8
    • 0025957008 scopus 로고    scopus 로고
    • A comprehensive model for inversion layer hole mobility for simulation of submicrometer MOSFET's
    • vol. 38, pp. 151-159, Jan. 1991.
    • Victor M. Agostinelli, Jr., Hyungsoon Shin, and A. F. Tasch, Jr., "A comprehensive model for inversion layer hole mobility for simulation of submicrometer MOSFET's," IEEE Trans. Electron Devices, vol. 38, pp. 151-159, Jan. 1991.
    • IEEE Trans. Electron Devices
    • Agostinelli Jr., V.M.1    Shin, H.2    Tasch Jr., A.F.3
  • 9
    • 0015656859 scopus 로고    scopus 로고
    • Relative importance of phonon scattering to carrier mobility in Si surface layer at room temperature
    • vol. 44, no. 8, pp 3619-3625, 1973.
    • Y. C. Cheng and E. A. Sullivan, "Relative importance of phonon scattering to carrier mobility in Si surface layer at room temperature," J. Appl. Phys., vol. 44, no. 8, pp 3619-3625, 1973.
    • J. Appl. Phys.
    • Cheng, Y.C.1    Sullivan, E.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.