The use of a double mask system to prevent Ti diffusion from a Ti/Pt/Au ohmic contact on diamond

Journal of the Electrochemical Society

Volumn 143, Issue 7, 1996, Pages 2392-2395

  Waytena, G L ^a   Hoff, H A ^a   Ma, D I ^a   Isaacson, I P ^a   Rebbert, M L ^a   Marrian, Christie ^a   Suehle, J S ^b  

^a NAVAL RESEARCH LABORATORY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DIFFUSION IN SOLIDS; INTERFACES (MATERIALS); MASKS; METALLIZING; OHMIC CONTACTS; TITANIUM;

DOUBLE MASK SYSTEM; INTERFACIAL DIFFUSION BARRIER;

SEMICONDUCTING DIAMONDS;

EID: 0030194894     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837013     Document Type: Article

References (9)

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