IC compatible planar inductors on silicon

IEE Proceedings: Circuits, Devices and Systems

Volumn 144, Issue 1, 1997, Pages 29-35

  Ronkainen, H ^a   Kattelus, H ^a   Tarvainen, E ^b   Riihisaari, T ^b   Andersson, M ^c   Kuivalainen, P ^c  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b NOKIA RESEARCH CENTER   (United States)

^c AALTO UNIVERSITY   (Finland)

Author keywords

BiCMOS technology; Modelling; Planar inductors

Indexed keywords

ALUMINUM; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; MATHEMATICAL MODELS; METALLIZING; OXIDES; SEMICONDUCTING SILICON;

BICMOS TECHNOLOGY; EQUIVALENT CIRCUIT MODEL; INDUCTOR DESIGN; OXIDE ISOLATION; PLANAR INDUCTORS; RECTANGULAR SPIRAL INDUCTORS; THICK ALUMINIUM METALLIZATION; THICK OXIDES;

ELECTRIC INDUCTORS;

EID: 0031071436     PISSN: 13502409     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-cds:19970748     Document Type: Article

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