Nanoscale ordering in amorphous silicon powders formed by plasma induced reaction of silane

Materials Science Forum

Volumn 235-238, Issue PART 2, 1997, Pages 595-600

  Hofmeister, H ^a   Dutta, J ^b   Hofmann, H ^b  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b EPFL   (Switzerland)

Author keywords

Clusters; Nano sized silicon particles; Nanoscale ordering; Plasma enhanced chemical vapour deposition; Visible photoluminescence

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; MASS SPECTROMETRY; MICROSCOPIC EXAMINATION; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SILANES;

PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;

AMORPHOUS SILICON;

EID: 0030853034     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Article

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