Applications of scanning optical microscopy in materials science to detect bulk microdefects in semiconductors

Journal of Microscopy

Volumn 188, Issue 1, 1997, Pages 1-16

  Torok P ^a,c   Mule'Stagno, L ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b MEMC Electronic Materials Inc   (United States)

^c UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Bulk defects; Materials science applications; Scanning infra red microscopy

Indexed keywords

NEAR FIELD SCANNING OPTICAL MICROSCOPY; SEMICONDUCTOR MATERIALS;

BULK DEFECTS; BULK MICRO DEFECTS; INFRA RED; LITERATURE REVIEWS; MATERIAL SCIENCE; MATERIAL SCIENCE APPLICATION; SCANNING INFRA-RED MICROSCOPY; SCANNING OPTICAL MICROSCOPY; SCIENCE APPLICATIONS; THEORETICAL ASPECTS;

OPTICAL DATA STORAGE;

CONTRAST ENHANCEMENT; IMAGE ANALYSIS; INFRARED SPECTROMETRY; PRIORITY JOURNAL; REVIEW; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; THEORY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0030659082     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.1997.2420800.x     Document Type: Review

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