Channeled ion beam synthesis: A new technique for forming high-quality rare-earth silicides

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 120, Issue 1-4, 1996, Pages 190-197

  Vantomme, A ^a   Wu, M F ^a,c   Wahl, U ^a   De Wachter, J ^a   Degroote, S ^a   Pattyn, H ^a   Langouche, G ^a   Bender, H ^b  

^a KU LEUVEN   (Belgium)

^b IMEC   (Belgium)

^c PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; MICROSCOPIC EXAMINATION; MONTE CARLO METHODS; RARE EARTH ADDITIONS; RARE EARTH COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SIMULATION; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

ION BEAM SYNTHESIS; RARE EARTH SILICIDES;

ION IMPLANTATION;

EID: 0030566462     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00507-1     Document Type: Article

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