CMOS foundry implementation of schottky diodes for RF detection

IEEE Transactions on Electron Devices

Volumn 43, Issue 12, 1996, Pages 2210-2214

  Milanović, Veljko ^a,b   Gaitan, Michael ^a   Marshall, Janet C ^a   Zaghloul, Mona E ^a  

^a George Washington University   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC POWER MEASUREMENT; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; SIGNAL DETECTION; SUBSTRATES; VOLTAGE MEASUREMENT;

CAPACITANCE VOLTAGE MEASUREMENTS; CURRENT VOLTAGE MEASUREMENTS; CUT OFF FREQUENCY;

SCHOTTKY BARRIER DIODES;

EID: 0030420164     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.544393     Document Type: Article

References (10)

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10. V. Milanović, M. Gaitan. E. Bowen, and M. Zaghloul, "Micromachined coplanar waveguides in CMOS technology," IEEE Microwave Guided Wave Lett., vol. 6, no. 10, 1996