Deposition of metal-containing diamond-like carbon films from metal-organic precursors using a plasma activated r.f. process

Diamond and Related Materials

Volumn 5, Issue 3-5, 1996, Pages 415-419

  Luithardt, W ^a   Schmidt, I ^a   Benndorf, C ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Chemical vapour deposition; Metal organic precursors; Plasma activation

Indexed keywords

EID: 0039690383     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00435-1     Document Type: Article

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