Optical properties of silicon-based materials: A comparison of porous and spark-processed silicon

Critical Reviews in Solid State and Materials Sciences

Volumn 21, Issue 4, 1996, Pages 265-351

  Ludwig, Matthias H ^a  

^a University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC SPARKS; ETCHING; PHOTOLUMINESCENCE; POROUS SILICON;

CRYSTALLINE SILICON; ELECTROCHEMICAL ETCHING; SPARK-PROCESSED SILICON;

SEMICONDUCTING SILICON;

EID: 0030385452     PISSN: 10408436     EISSN: None     Source Type: Journal    
DOI: 10.1080/10408439608241257     Document Type: Review

References (221)

1. DeTar, J., Electron. News, 41, 8, 1995.
2. Kamarinos, G. and Felix, P., J. Phys. D, 29, 487, 1996.
3. Uhlir, A., Bell Syst. Tech. J., 35, 333, 1956.
4. Turner, D. R., J. Electrochem. Soc., 105, 402, 1958.
5. Watanabe, Y., Arita, Y., Yokoyama, T., and Igarashi, Y., J. Electrochem. Soc., 122, 1351, 1975.
6. Imai, K., Solid State Electron., 24, 159, 1981.
7. Canham, L. T., Appl. Phys. Lett., 57, 1046, 1990.
8. Cullis, A. G. and Canham, L. T., Nature (London), 353, 335, 1991.
9. Lehmann, V. and Gösele, U., Appl. Phys. Lett., 58, 856, 1991; Lehmann, V. and Gösele, U., Adv. Mater. Res., 4, 114, 1992.
10. Lehmann, V. and Gösele, U., Appl. Phys. Lett., 58, 856, 1991; Lehmann, V. and Gösele, U., Adv. Mater. Res., 4, 114, 1992.
11. Koch, F., Petrova-Koch, V., Muschik, T., Nikolov, A., and Gavrilenko, V., Proc. Mater. Res. Soc., 283, 197, 1993; Koch, F., Proc. Mater. Res. Soc., 298, 319, 1993.
12. Koch, F., Petrova-Koch, V., Muschik, T., Nikolov, A., and Gavrilenko, V., Proc. Mater. Res. Soc., 283, 197, 1993; Koch, F., Proc. Mater. Res. Soc., 298, 319, 1993.
13. Koch, F. and Petrova-Koch, V., Porous Silicon, Chuan Feng, Z. and Tsu, R., Eds., World Scientific, New York, 1995, 133.
14. Prokes, S. M., Glembocki, O. J., Bermudez, V. M., Kaplan, R., Friedersdorf, L. E., and Searson, P. C., Phys. Rev. B, 45, 13788, 1992.
15. Brandt, M. S., Fuchs, H. D., Stutzmann, M., Weber, J., and Cardona, M., Solid State Commun., 81, 302, 1992.
16. Tamura, H., Rückschloss, M., Wirschen, T., and Veprek, S., Appl. Phys. Lett., 65, 1537, 1994.
17. Prokes, S. M., Appl. Phys. Lett., 62, 3244, 1993.
18. Kanemitsu, Y., Ogawa, T., Shiraishi, K., and Tageda, K., Phys. Rev. B, 48, 4883, 1993.
19. Pickering, C., Beale, M. I. J., Robbins, D. J., Pearson, P. J., and Greef, R., J. Phys. C, 17, 6535, 1984.
20. Di Maria, D. J., Kirtley, J. R., Pakulis, E. J., Dong, D. W., Kuan, T. S., Pesavento, F. L., Theis, T. N., and Cutro, J. A., J. Appl. Phys., 56, 401, 1984.
21. Furukawa, S. and Miyasato, T., Jpn. J. Appl. Phys., 27, L2207, 1988; Phys. Rev. B, 38, 5726, 1988.
22. Furukawa, S. and Miyasato, T., Jpn. J. Appl. Phys., 27, L2207, 1988; Phys. Rev. B, 38, 5726, 1988.
23. Takagi, H., Ogawa, H., Yamazaki, Y., Ishizaki, A., and Nakagiri, T., Appl. Phys. Lett., 56, 2379, 1990.
24. Hummel, R. E. and Chang, S.-S., Appl. Phys. Lett., 61, 1965, 1992.
25. Hummel, R. E., Ludwig, M. H., and Chang, S.-S., Solid State Commun., 93, 237, 1995.
26. Ludwig, M. H., Menniger, J., and Hummel, R. E., J. Phys. Condens. Matter, 7, 9081, 1995.
27. Yuan, J. and Haneman, D., Appl. Phys. Lett., 67, 3328, 1995.
28. St. John, J. V., Coffer, J. L., Gyu Rho, Y., and Pinizzotto, R. F., paper presented at 188th Meeting of the Electrochemical Society, Chicago, 1995.
29. Hummel, R. E., Morrone, A., Ludwig, M. H., and Chang, S.-S., Appl. Phys. Lett., 63, 2771, 1993.
30. Ludwig, M. H., in Handbook of Optical Properties: Optics of Small Particles, Hummel, R. E., Ed., CRC Press, Boca Raton, FL, 1996, Chap. 5.
31. Uimonen, T., Electron. News, 40, 34, 1994.
32. Bludau, W., Onton, A., and Heinke, W., J. Appl. Phys., 45, 1846, 1974.
33. Jellison, G. J. and Modine, F. A., Phys. Rev. B, 27, 7466, 1983.
34. Wraback, M. and Taue, J., Phys. Rev. Lett., 69, 3682, 1992.
35. Shaklee, K. L. and Nahory, R. E., Phys. Rev. Lett., 24, 942, 1970.
36. Yablonovitch, E. and Gmitter, T., Appl. Phys. Lett., 49, 587, 1986.
37. Bradfield, P. L., Brown, T. G., and Hall, D. G., Appl. Phys. Lett., 51, 100, 1989.
38. Ennen, H., Schneider, J., Pomrenke, G., and Axmann, A., Appl. Phys. Lett., 43, 943, 1983.
39. Laming, R. I., Townsend, J. E., Payne, D. N., Meli, F., Grasso, G., and Tarbox, E. J., IEEE Photonics Technol. Lett., 3, 253, 1991.
40. Brus, L. E., J. Chem. Phys., 80, 4403, 1984.
41. Kayanuma, Y., Phys. Rev. B, 38, 9797, 1988.
42. Okada, R., and Ijima, S., Appl. Phys. Lett., 58, 1662, 1991.
43. Laiho, R. and Pavlov, A., Thin Solid Films, 255, 9, 1995.
44. El-Shall, M. S., Li, S., Turkki, T., Graiver, D., Pernisz, U. C., and Baraton, M. I., J. Phys. Chem., 99, 17805, 1995.
45. Littau, K. A., Szajowski, P. J., Muller, A. J., Kortan, A. R., and Brus, L. E., J. Phys. Chem., 97, 1224, 1993.
46. Zhu, J. G., White, C. W., Budai, J. D., Withrow, S. P., and Chen, Y., Mater. Res. Soc. Symp., 358, 175, 1995.
47. Schuppler, S., Friedman, S. L., Marcus, M. A., Adler, D. L., Xie, Y.-H., Ross, F. M., Harris, T. D., Brown, W. L., Chabal, Y. J., Brus, L. E., and Citrin, P. H., Phys. Rev. Lett., 72, 2648, 1995.
48. Brus, L., J. Phys. Chem., 98, 3575, 1994.
49. Brus, L. E., Szajowski, P. F., Wilson, W. L., Harris, T. D., Schuppler, S., and Citrin, P. H., J. Am. Chem. Soc., 117, 2915, 1995.
50. Hill, N. A. and Whaley, B., Mater. Res. Soc. Symp., 358, 25, 1995.
51. Hybertsen, M. S., Phys. Rev. Lett., 72, 1514, 1994.
52. Uda, T. and Hirao, M., J. Phys. Soc. Jpn., 63 (Suppl. B), 97, 1994.
53. Proot, J. P., Delerue, C., and Allan, G., Appl. Phys. Lett., 61, 1948, 1992.
54. Delley, B. and Steigmeier, E. F., Phys. Rev. B, 47, 1397, 1993.
55. Miller, R. D. and Michl, J., Chem. Rev., 89, 1359, 1989.
56. Bianconi, P. A., Schilling, F. C., and Weidman, T. W., Macromolecules, 22, 1697, 1989.
57. Kishida, H., Hasegawa, T., Iwasa, Y., Koda, T., Tokura, Y., Tachibana, H., Matsumoto, M., Wada, S., Lay, T. T., and Tashiro, H., Phys. Rev. B, 50, 7786, 1994.
58. Takeda, K. and Shiraishi, K., Philos. Mag., 65, 535, 1989; Phys. Rev. B, 39, 11028, 1989.
59. Takeda, K. and Shiraishi, K., Philos. Mag., 65, 535, 1989; Phys. Rev. B, 39, 11028, 1989.
60. Takeda, K., J. Phys. Soc. Jpn., 63 (Suppl. B), 1, 1994.
61. Tachibana, H., Matsumoto, M., Tokura, Y., Moritomo, Y., Yamaguchi, A., Koshihara, S., Miller, R. D., and Abe, S., Phys. Rev. B, 47, 4363, 1992.
62. Rosenbauer, M., Ph.D. dissertation, Technische Universität München, 1995.
63. Kanemitsu, Y., Suzuki, K., Nakayoshi, Y., and Masumoto, Y., Phys. Rev. B, 46, 3916, 1992.
64. Hirabayashi, I., Morigaki, K., and Yamanaka, S., J. Non-Cryst. Solids, 59/60, 645, 1983.
65. Tokura, Y., Tachibana, H., Kishida, H., Moritomo, Y., and Matsumoto, M., J. Phys. Soc. Jpn., 63 (Suppl. B), 30, 1994.
66. Ito, O., Terazima, M., Azumi, T., Matsumoto, N., Takeda, K., and Fujino, M., Macromolecules, 22, 1718, 1989.
67. Kishida, K., Tachibana, H., Matsumoto, M., and Tokura, Y., J. Appl. Phys., 78, 3362, 1995.
68. Engemann, D. and Fischer, R., Amorphous and Liquid Semiconductors, Stuke, J. and Brenig, W., Eds., Taylor & Francis, London, 1973, 947.
69. Street, R. A., Adv. Phys., 30, 593, 1981.
70. Wang, W. and Fritzsche, H., in Amorphous Silicon and Related Materials, Fritzsche, H., Ed., World Scientific, 1988, 779.
71. Tsang, C. and Street, R. A., Phys. Rev. B, 19, 3027, 1979.
72. Yang, J. and Guha, S., Appl. Phys. Lett., 61, 2917, 1992.
73. Muschik, T. and Schwarz, R., J. Non-Cryst. Solids, 164-166, 619, 1993.
74. Cody, G. D., Abeles, B., Wronski, C. R., Stephens, R. B., and Brooks, B., Solid Cells, 2, 227, 1980.
75. Wolford, D. J., Reimer, J. A., and Scott, B. A., Appl. Phys. Lett., 42, 369, 1983.
76. Muschik, T., Ph.D. dissertation, Technische Universität München, 1993.
77. Jackson, W. B. and Nemanich, R. J., J. Non-Cryst. Solids, 59/60, 353, 1983.
78. Orlowski, T. E. and Scher, H., Phys. Rev. Lett., 54, 220, 1985.
79. Collins, R. W., Paesler, M. A., and Paul, W., Solid State Commun., 34, 833, 1980.
80. Street, R. A. and Biegelsen, D. K., in The Physics of Hydrogenated Amorphous Silicon II, Joannopoulos, J. D. and Lucovsky, G., Eds., Springer-Verlag, 1984, 208.
81. Pankove, J. I. and Carlson, D. E., Appl. Phys. Lett., 29, 620, 1976.
82. Paasche, S., Toyama, T., Okamoto, H., and Hamakawa, Y., Trans. Electr. Dev., 36, 2895, 1989.
83. Boonkosum, W., Krugangam, D., and Panyakeow, S., Jpn. J. Appl. Phys., 32, 1534, 1993.
84. Stewart, A. D. and Jones, D. I., Philos. Mag. B, 57, 431, 1988.
85. Mott, N. F. and Davis, E. A., Electronic Processes in Non-Crystalline Materials, Clarendon Press, Oxford, 1979, chap. 2.
86. Ching, W. Y., Phys. Rev. B, 26, 6610, 1982.
87. Ni, J. and Arnold, E., Appl. Phys. Lett., 39, 554, 1981.
88. Phillip, H. R., J. Electrochem. Soc., 120, 295, 1973.
89. Carius, R., Fischer, R., Holzenkämpfer, E., and Stuke, J., J. Appl. Phys., 52, 4241, 1981.
90. Carius, R., Jahn, K., Siebert, W., and Fuhs, W., J. Luminesc., 31/32, 354, 1984.
91. Friebele, E. J., Griscom, D. L., and Marrone, M. J., J. Non-Cryst. Solids, 71, 133, 1985.
92. Pio, F., Guzzi, M., Spinolo, G., and Martini, M., Phys. Status Solidi B, 159, 577, 1990.
93. Stathis, J. H. and Kastner, M. A., Phys. Rev. B, 35, 2972, 1987.
94. Boscaino, R., Cannas, M., Gelardi, F. M., and Leone, M., J. Phys. Condens. Matter, 8, L545, 1996.
95. Griscom, D. L., J. Ceramic Soc. Jpn., 99, 923, 1991.
96. Fischer, R., in Topics in Applied Physics, Vol. 36, Brodsky, M. H., Ed., Springer-Verlag, Berlin, 1979, 159.
97. Skuja, L. N., Streletsky, A. N., and Pakovich, A. B., Solid State Commun., 50, 1069, 1984.
98. Tohmon, R., Shimogaichi, Y., Mizuno, H., Ohki, Y., Nagasawa, K., and Hama, Y., Phys. Rev. Lett., 62, 1388, 1989.
99. Jones, C. E. and Embree, D., J. Appl. Phys., 47, 5365, 1976.
100. Nishikawa, H., Shiroyama, T., Nakamura, R., Ohki, Y., Nagasawa, K., and Hama, Y., Phys. Rev. B, 45, 586, 1992.
101. Bagratashvili, V. N., Tsypina, S. I., Radtsig, V. A., Rybaltovskii, A. O., Chernow, P. V., Alimpiev, S. S., and Simanovskii, Y. O., J. Non-Cryst. Solids, 180, 221, 1995.
102. Liao, L.-S., Bao, X.-M., Zheng, X.-Q., Li, N. S., and Min, N.-B., Appl. Phys. Lett., 68, 850, 1996.
103. Kasymdzhanov, M. A., Kurbanov, S. S., and Khabibullaev, P. K., Sov. Phys. Dokl., 32, 896, 1987.
104. Tanimura, K., Tanaka, T., and Itoh, N., Phys. Rev. Lett., 51, 423, 1983.
105. O'Reilly, E. P. and Robertson, J., Phys. Rev. B, 27, 3780, 1983.
106. Sakurai, Y., Nagasawa, K., Nishikawa, H., and Ohki, Y., J. Appl. Phys., 75, 1372, 1994.
107. Skuja, L., Solid State Commun., 84, 613, 1992.
108. Shimizu-Iwayama, T., Nakao, S., and Saitoh, K., Appl. Phys. Lett., 65, 1814, 1994.
109. Awazu, K. and Kawazoe, H., J. Appl. Phys., 68, 3584, 1990.
110. Mutti, P., Ghislotti, G., Bertoni, S., Bonoldi, L., Cerofolini, G. F., Meda, L., Grilli, E., and Guzzi, M., Appl. Phys. Lett., 66, 851, 1995.
111. Tompa, G. S., Morton, D. C., Sywe, B. S., Lu, Y., Forsythe, E. W., Ott, J. A., Smith, D., Khurgin, J., and Khan, B. A., Mater. Res. Soc. Symp., 358, 701, 1995.
112. Kenyon, A. J., Trwoga, P. F., Pitt, C. W., Rehm, G., J. Appl. Phys., 79, 9291, 1996.
113. Fischer, T., Petrova-Koch, V., Shcheglov, K., Brandt, M. S., and Koch, F., European Materials Research Society Spring Meeting (1995), Strasbourg, in preparation.
114. Kanemitsu, Y., Phys. Rep., 263, 3, 1995.
115. Hamilton, B., Semicond. Sci. Technol., 10, 1187, 1995.
116. Prokes, S. M., J. Mater. Res., 11, 305, 1996.
117. Fauchet, P. M., Adv. Phot. Mat. f. Inform. Technol., SPIE Proc. 2144.
118. Beale, M. J., Chew, N. G., Uren, M. J., and Cullis, A. G., Appl. Phys. Lett., 46, 86, 1985.
119. Beale, M. J., Benjamin, J. D., Uren, M. J., Chew, N. G., and Cullis, A. G., J. Cryst. Growth, 75, 408, 1986.
120. Lehmann, V. and Holl, H., J. Electrochem. Soc., 137, 653, 1990.
121. Doan, V. V. and Sailor, M. J., Appl. Phys. Lett., 60, 619, 1992.
122. Lehmann, V., Cerva, H., and Gösele, U., Mater. Res. Soc. Symp. Proc., 256, 3, 1992.
123. Lehmann, V., Thin Solid Films, 255, 1, 1995.
124. Fathauer, R. W., George, T., Kzendzov, A., and Vasquez, R. P., Appl. Phys. Lett., 61, 2350, 1992.
125. Herino, R., Bromchil, G., Barla, K., Bertrand, C., and Ginoux, J. L., J. Electrochem. Soc., 13, 1994, 1987.
126. Steckl, A. J., Xu, J., and Mogul, H. C., Appl. Phys. Lett., 62, 2111, 1993.
127. Pearsall, T. P., Adams, J. C., Kidder, J. N., Williams, P. S., Chambers, S. A., Lach, J., Schwartz, D. T., and Nosho, B. Z., Thin Solid Films, 222, 200, 1992.
128. Russel, S. D., Dubbelday, W. B., Georgief, P., and Shimabukuro, R. L., J. Appl. Phys., 76, 6012, 1994.
129. Barla, K., Bomchil, R., Herino, R., and Pfister, J. C., J. Cryst. Growth, 68, 721, 1984.
130. Gardelis, S., Bangert, U., and Hamilton, B., Thin Solid Films, 255, 167, 1995.
131. Kim, K. H., Bai, G., and Nicolet, M.-A., J. Appl. Phys., 69, 2201, 1991.
132. van Bardeleben, H. J., Stievenard, D., Grosman, A., Ortega, C., and Siejka, J., Appl. Sci., 244, 191, 1993.
133. Petrova-Koch, V., Kux, A., Müller, F., Muschik, T., Koch, F., and Lehmann, V., Mater. Res. Soc. Symp. Proc., 256, 41, 1992.
134. Miyazaki, S., Yasaka, T., Okamoto, K., Shiba, K., Sakamoto, K., and Hirose, M., Mater. Res. Soc. Symp., 256, 185, 1992.
135. O'Keeffe, P., Aoyagi, Y., Komuro, S., Kato, T., and Morikawa, T., Appl. Phys. Lett., 66, 836, 1995.
136. Iqbal, Z., Veprek, S., Webb, A. P., and Capezzuto, P., Solid State Commun., 37, 993, 1981.
137. Campbell, I. H. and Fauchet, P. M., Solid State Commun., 739, 1986.
138. Sui, Z., Leong, P. P., and Herman, I. P., Appl. Phys. Lett., 60, 2086, 1992.
139. Zhang, S. L., Hou, Y. T., and Ho, K. S., J. Appl. Phys., 72, 4469, 1992.
140. Steigmeier, E. F., Auderset, H., Delley, B., and Morf, R., J. Luminesc., 57, 9, 1993.
141. Kanemitsu, Y., Uto, H., Matsumoto, Y., Matsumoto, T., Futagi, T., and Miniura, H., Phys. Rev. B, 48, 2827, 1993.
142. Tischler, M. A., Collins, R. T., Tsang, J. C., Stathis, J. H., Batstone, J. L., and Zollner, S., Mater. Res. Soc. Symp., 256, 180, 1992.
143. Inoue, K., Matsuda, O., Maehashi, K., Nakashima, H., and Murase, K., Jpn. J. Appl. Phys., 31, L997, 1992.
144. Kozlowski, K. and Lang, W., J. Appl. Phys., 72, 5401, 1992.
145. Sugiyama, H. and Nittono, O., J. Cryst. Growth, 103, 156, 1990.
146. Wu, X.-L., Yan, F., Zhang, M.-S., and Feng, D., Phys. Lett. A, 205, 117, 1995.
147. Tsu, R., Shen, H., and Dutta, M., Appl. Phys. Lett., 60, 112, 1992.
148. Sagnes, I., Halimaoui, A., Vincent, G., and Badoz, P. A., Appl. Phys. Lett., 62, 1155, 1993.
149. Kux, A. and Chorin, M. B., Mater. Res. Soc. Symp., 358, 447, 1995.
150. Schoisswohl, M., von Bardeleben, H. J., Bratus, V., and Münder, H., Thin Solid Films, 255, 163, 1995.
151. Mauckner, G., Thonke, K., and Sauer, R., J. Phys. C, 5, L9, 1993.
152. Brandt, M. S. and Stutzmann, M., Appl. Phys. Lett., 61, 2569, 1992.
153. Gardelis, S., Hamilton, B., Kubiak, R. A., Whall, T. E., and Parker, E. C. H., Mater. Res. Soc. Symp., 256, 149, 1992.
154. Mauckner, G., Thonke, K., Baier, T., Walter, T., and Sauer, R., J. Appl. Phys., 75, 4167, 1994.
155. Fauchet, Ph. M., Mater. Res. Soc. Symp., 358, 525, 1995.
156. Tischler, M. A., Collins, R. T., Stathis, J. H., and Tsang, J. C., Appl. Phys. Lett., 60, 639, 1992; Collins, R. T., Tischler, M. A., and Stathis, J. H., Appl. Phys. Lett., 61, 1649, 1992.
157. Tischler, M. A., Collins, R. T., Stathis, J. H., and Tsang, J. C., Appl. Phys. Lett., 60, 639, 1992; Collins, R. T., Tischler, M. A., and Stathis, J. H., Appl. Phys. Lett., 61, 1649, 1992.
158. Xu, L. Y., Gal, M., and Gross, M., Appl. Phys. Lett., 60, 1375, 1992.
159. Robinson, M. B., Dillon, A. C., Hayes, D. R., and George, S. M., Appl. Phys. Lett., 61, 1414, 1992.
160. Zoubir, N. H., Vergnat, M., Delatour, T., Burneau, A., and de Donato, Ph., Appl. Phys. Lett., 65, 82, 1994.
161. Meyer, B. K., Hofmann, D. M., Christmann, P., Stadler, W., Nikolov, A., Scharmann, A., and Hofstaetter, A., Mater. Res. Soc. Symp., 358, 453, 1995.
162. Tsybeskov, L. and Fauchet, P. M., Appl. Phys. Lett., 64, 1983, 1994.
163. Tsai, C., Li, K. H., Kinosky, D. S., Quian, R. Z., Hsu, T.-C., Irby, J. T., Banerjee, S. K., Tasch, A. F., Campbell, J. C., Hance, B. K., and White, J. M., Appl. Phys. Lett., 60, 1700, 1992.
164. Fuchs, H. D., Stutzmann, M., Brandt, M. S., Rosenbauer, M., Weber, J., Breitschwerdt, A., Deak, P., and Cardona, M., Phys. Rev. B, 48, 8172, 1993.
165. Petrova-Koch, V., Muschik, T., Kux, A., Meyer, B. K., Koch, F., and Lehmann, V., Appl. Phys. Lett., 61, 943, 1992.
166. Nakajima, A., Itakura, T., Watanabe, S., and Nakyama, N., Appl. Phys. Lett., 61, 46, 1992.
167. Lee, E. J., Ha, J. S., and Sailor, M. J., J. Am. Chem. Soc., 117, 8295, 1995.
168. Delerue, C., Allan, G., and Lannoo, M., Phys. Rev. B, 48, 11024, 1993.
169. Calcott, P. D. J., Nash, K. J., Canham, L. T., Kane, M. J., and Brumhead, D., J. Phys. Condens. Matter, 5, L91, 1993.
170. Petrova-Koch, V., Muschik, T., Fischer, T., and Fojtik, A., in Handbook of Optical Properties: Optics of Small Particles, Hummel, R. E., Ed., CRC Press, Boca Raton, FL, 1996.
171. Prokes, S. M., Carlos, W. E., and Glembocki, O. J., Phys. Rev. B, 50, 17093, 1994.
172. Jung, K. H., Shih, S., Kwong, D. L., Cho, C. C., and Gnade, B. E., Appl. Phys. Lett., 61, 2467, 1992.
173. Takeda, K. and Shiraishi, K., Solid State Commun., 85, 301, 1993.
174. Kanemitsu, Y., Masumoto, T., Futagi, T., and Mimura, H., Mater. Res. Soc. Symp., 298, 205, 1993.
175. Tsybeskov, L., Vandyshew, Ju., and Fauchet, P. M., Phys. Rev. B, 49, 7821, 1994.
176. Hou, X. Y., Shi, G., Wang, W., Zhang, F. L., Hao, P. H., Huang, D. M., and Wang, X., Appl. Phys. Lett., 62, 1097, 1993.
177. Kovalev, D. I., Yaroshetzkii, I. D., Muschik, T., Petrova-Koch, V., and Koch, F., Appl. Phys. Lett., 64, 214, 1994.
178. Zheng, X. L., Wang, W., and Chen, H. C., Appl. Phys. Lett., 60, 986, 1992.
179. Kux, A., Kovalev, D., and Koch, F., Thin Solid Films, 255, 143, 1995.
180. Kanemitsu, Y., Futagi, T., Matsumoto, T., and Mimura, H., Phys. Rev. B, 49, 14732, 1994.
181. Lee, M. K. and Peng, K. R., Appl. Phys. Lett., 62, 3159, 1993.
182. Kontkiewicz, A. J., Kontkiewicz, A. M., Siejka, J., Sen, S., Nowak, G., Hoff, A. M., Sakthivel, P., Ahmed, K., Mukherjee, P., Witanachchi, S., and Lagowski, J., Appl. Phys. Lett., 65, 1436, 1994.
183. Iler, K., in The Chemistry of Silica, John Wiley & Sons, New York, 1979.
184. Veprek, S., Rückschloß, M., Wirschem, Th., and Landkammer, B., Appl. Phys. Lett., 67, 2215, 1995.
185. Unagami, T., Jpn. J. Appl. Phys., 19, 231, 1980.
186. Liu, H. I., Biegelsen, D. K., Johnson, M. N., Ponce, F. A., Maluf, N. I., and Pease, R. W., Mater. Res. Soc. Symp., 283, 57, 1993.
187. Sapoval, B., Russ, S., and Chazalviel, J.-N., J. Phys. Condens. Matter., 8, 6235, 1996.
188. Hummel, R. E. and Ludwig, M. H., J. Luminesc., 68, 69, 1996.
189. Ludwig, M. H., Hummel, R. E., and Chang, S.-S., J. Vac. Sci. Technol. B, 12, 3023, 1994.
190. Ludwig, M. H., Hummel, R. E., and Stora, M., Thin Solid Films, 255, 103, 1995.
191. Proud, J. M., Gottscho, R. A., Bondur, J., Garscadden, A., Heberlein, J., Herb, G. K., Kushner, M. J., Lawler, J., Lieberman, M., Mayer, T. M., Phelps, A. V., Roman, W., Sawin, H., Winters, H., Perepezko, J., Hazi, A. U., Kennel, C., and Gerardo, J., NRC Report, National Academy Press, Washington, D.C., 1991.
192. Sukhodrev, N. K., Transactions of the P. N. Lebedev Physics Institute, Vol. 15, Academy of Sciences of the U.S.S.R., 1982, part. 3.
193. Warburg, E., Jahrb. Radioakt. Elektron., 6, 181, 1909.
194. Mandich, M. L. and Reents, W. D., J. Chem. Phys., 96, 4233, 1992.
195. Brodski, M. H., Thin Solid Films, 40, L23, 1977.
196. Chang, S.-S., Ph.D. dissertation, University of Florida, Gainesville, 1994.
197. Kurmaev, E. Z., Shamin, S. N., Galakhov, V. R., Sokolov, V. I., Ludwig, M. H., and Hummel, R. E., J. Phys. Condens. Matter, in press.
198. Wiech, G., Feldhutter, H.-O., and Simunek, A., Phys. Rev. B, 47, 6981, 1993.
199. Hosono, H. and Matsunami, N., Phys. Rev. B, 48, 13469, 1993.
200. Lucovsky, G., Richard, P. D., Tsu, D. V., Lin, S. Y., and Markunas, R. J., J. Vac. Sci. Technol., A4, 681, 1986.
201. Gupta, P., Dillon, A. C., Bracker, A. S., and George, S. M., Surf. Sci., 245, 360, 1991.
202. Rüter, D., Kunze, T., and Bauhofer, W., Appl. Phys. Lett., 64, 3006, 1994.
203. Rüter, D., Rolf, S., Bauhofer, W., Klar, P. J., and Wolverson, D., Thin Solid Films, 255, 305, 1995.
204. Hummel, R. E., Ludwig, M. H., Chang, S.-S., and LaTorre, G., Thin Solid Films, 255, 219, 1995.
205. Augustin, A., Diploma thesis, Technische Universität München, Physik Department, 1996.
206. Ludwig, M. H., Augustin, A., Hummel, R. E., and Gross, Th., J. Appl. Phys., 80, 5318, 1996.
207. Ludwig, M. H., Augustin, A., and Hummel, R. E., Semicond. Sci. Technol., submitted.
208. Rupp, H. J., Trodahl, H. J., Quilty, J., Ludwig, M. H., and Hummel, R. E., Appl. Phys. Lett., submitted.
209. Lucovsky, G., Santos-Filho, P., Lu, Z., Jing, Z., and Whitten, J. L., J. Non-Cryst. Solids, 190, 169, 1995.
210. Hummel, R. E., Ludwig, M. H., Hack, J., and Chang, S.-S., Solid State Commun., 96, 683, 1995.
211. Augustine, B. H., Irene, E. A., He, Y. J., Price, K. J., McNeil, L. E., Christensen, K. N., and Maher, D. M., J. Appl. Phys., 78, 4020, 1995.
212. Wakita, K., Makimura, S., and Nakayama, Y., Jpn. J. Appl. Phys., 34, 1425, 1995.
213. Ghandhi, S. K., in VLSI Fabrication Principles. Silicon and Gallium Arsenide, John Wiley & Sons, New York, 1983.
214. Rosenbauer, M., Stutzmann, M., Fuchs, H. D., Finkenbeiner, S., and Weber, J., J. Lumin., 57, 153, 1993.
215. Austin, I. G., Jackson, W. A., Searle, T. M., Bhat, P. K., and Gibson, R. A., Philos. Mag. B, 51, 271, 1985.
216. Hummel, R. E., Ludwig, M. H., Chang, S.-S., Fauchet, P. M., Vandyshev, Ju. V., and Tsybeskow, L., Solid State Commun., 95, 553, 1995.
217. Ludwig, M. H., Hummel, R. E., Augustin, A., Hack, J., and Menniger, J., Appl. Phys. Lett., 67, 2542, 1995.
218. Mitsui, T., Yamamoto, N., Takemoto, T., and Nittono, O., Jpn. J. Appl. Phys., 33, L342, 1994.
219. Suzuki, T., Sakai, T., Zhang, L., and Nishiyama, Y., Appl. Phys. Lett., 66, 215, 1995.
220. Mitchell, J. P. and Denure, D. G., Solid State Electron., 16, 825, 1973.
221. Williams, R., Phys. Rev., 140, A569, 1965.