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Volumn 17, Issue 10, 1996, Pages 464-466

On the accuracy and efficiency of substrate current calculations for Sub-μm n-MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; ELECTRIC CURRENTS; ELECTRIC FIELDS; IONIZATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; SUBSTRATES;

EID: 0030269580     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.537076     Document Type: Article
Times cited : (22)

References (17)
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    • Fischetti, M.V.1    Laux, S.E.2    Crabbé, E.3
  • 2
    • 0029393178 scopus 로고
    • Impact ionization and distribution functions in sub-micron n-MOSFET technologies
    • J. Bude and M. Mastrapasqua, "Impact ionization and distribution functions in sub-micron n-MOSFET technologies," IEEE Electron Device Lett., vol. 16, pp. 439-441, 1995.
    • (1995) IEEE Electron Device Lett. , vol.16 , pp. 439-441
    • Bude, J.1    Mastrapasqua, M.2
  • 3
    • 0030190768 scopus 로고    scopus 로고
    • A soft threshold lucky electron model for efficient and accurate numerical device simulation
    • C. Jungemann, R. Thoma, and W. L. Engl, "A soft threshold lucky electron model for efficient and accurate numerical device simulation," Solid-State Electron., vol. 39, pp. 1079-1086, 1996.
    • (1996) Solid-State Electron. , vol.39 , pp. 1079-1086
    • Jungemann, C.1    Thoma, R.2    Engl, W.L.3
  • 6
    • 11744302281 scopus 로고    scopus 로고
    • Accurate prediction of hot-carrier effects for a deep sub-μm CMOS technology based on inverse modeling and full-band Monte Carlo device simulation
    • C. Jungemann, S. Yamaguchi, and H. Goto, "Accurate prediction of hot-carrier effects for a deep sub-μm CMOS technology based on inverse modeling and full-band Monte Carlo device simulation," in Proc. SISPAD, 1996.
    • (1996) Proc. SISPAD
    • Jungemann, C.1    Yamaguchi, S.2    Goto, H.3
  • 7
    • 4243169045 scopus 로고
    • On the influence of band structure and scattering rates on hot electron modeling
    • H. Ryssel and P. Pichler, Eds. Berlin: Springer-Verlag
    • C. Jungemann, S. Keith, B. Meinerzhagen, and W. L. Engl, "On the influence of band structure and scattering rates on hot electron modeling," in Simulation of Semiconductor Devices and Processes, H. Ryssel and P. Pichler, Eds. Berlin: Springer-Verlag, 1995, vol. 6, pp. 222-225.
    • (1995) Simulation of Semiconductor Devices and Processes , vol.6 , pp. 222-225
    • Jungemann, C.1    Keith, S.2    Meinerzhagen, B.3    Engl, W.L.4
  • 9
    • 84920737787 scopus 로고    scopus 로고
    • Efficient full-band Monte Carlo hot-carrier simulation for silicon devices
    • C. Jungemann, S. Yamaguchi, and H. Goto, "Efficient full-band Monte Carlo hot-carrier simulation for silicon devices," in Proc. ESSDERC, 1996.
    • (1996) Proc. ESSDERC
    • Jungemann, C.1    Yamaguchi, S.2    Goto, H.3
  • 10
    • 0026817615 scopus 로고
    • A semi-empirical model of surface scattering for Monte Carlo simulation of silicon n-MOSFET's
    • E. Sangiorgi and M. R. Pinto, "A semi-empirical model of surface scattering for Monte Carlo simulation of silicon n-MOSFET's," IEEE Trans. Computer-Aided Design, vol. 39, pp. 356-361, 1992.
    • (1992) IEEE Trans. Computer-Aided Design , vol.39 , pp. 356-361
    • Sangiorgi, E.1    Pinto, M.R.2
  • 13
    • 0024663115 scopus 로고
    • Coupled Monte Carlo drift diffusion analysis of hot-electron effects in MOSFET's
    • J. M. Higman, K. Hess, C. G. Hwang, and R. W. Dutton, "Coupled Monte Carlo drift diffusion analysis of hot-electron effects in MOSFET's," IEEE Trans. Electron Devices, vol. 36, pp. 930-937, 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 930-937
    • Higman, J.M.1    Hess, K.2    Hwang, C.G.3    Dutton, R.W.4
  • 15
    • 33749934297 scopus 로고    scopus 로고
    • Phase space multiple refresh: A versatile statistical enhancement method for Monte Carlo device simulation
    • C. Jungemann, S. Decker, R. Thoma, W. L. Engl, and H. Goto, "Phase space multiple refresh: A versatile statistical enhancement method for Monte Carlo device simulation," in Proc. SISPAD, 1996.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.