A novel technique for the fabrication of sub-20nm metallic wires

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 467-470

  Hoole, A C F ^a   Broers, A N ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IRRADIATION; MICROELECTRONIC PROCESSING; SILICA; SURFACES;

METALLIC WIRES; ULTRA FINE TRENCHES;

WIRE;

EID: 0029732792     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00289-8     Document Type: Article

References (7)

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3. X. Pan and A.N. Broers, Nanolithography: A Borderland between STM, EB, IB and X-Ray Lithographies, M. Gentili et-al.(eds.), Kluwer Academic Publishers, pp. 45,(1994).
4. A.N. Broers, J. Electrochemical Soc.,128(1),pp. 166,(1981).
5. X. Pan, D.R. Allee, A.N. Broers, Y.S. Tang and C.W. Wilkinson, Appl Phys. Lett. , 59(24), pp. 3157,(1991).
6. A.C.F. Hoole and A.N. Broers, J. Vac. Sci. Technol. B, 10(6), pp. 2855,(1992).
7. A.N. Broers, A.E. Timbs and R. Koch, Microelect. Eng., 9, pp. 187,(1989).