|
Volumn 143, Issue 7, 1996, Pages 2305-2309
|
Investigation of island formation during through-mask electrochemical micromachining
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ALGORITHMS;
BOUNDARY ELEMENT METHOD;
ELECTRIC CURRENT DISTRIBUTION;
ELECTROLYTIC POLISHING;
FILM GROWTH;
MATHEMATICAL MODELS;
PHOTORESISTS;
PROBLEM SOLVING;
ISLAND FORMATION;
MOVING BOUNDARY ALGORITHM;
SHAPE EVOLUTION;
THROUGH MASK ELECTROCHEMICAL MICROMACHINING;
MICROMACHINING;
|
EID: 0030192804
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1836997 Document Type: Article |
Times cited : (52)
|
References (14)
|