Effect of mask wall angle on shape evolution during through-mask electrochemical micromachining

Journal of the Electrochemical Society

Volumn 143, Issue 2, 1996, Pages 544-549

  Shenoy, R V ^a   Datta, M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; BOUNDARY ELEMENT METHOD; DISSOLUTION; ELECTRIC CURRENT DISTRIBUTION; ELECTRODES; ETCHING; LAPLACE TRANSFORMS; MATHEMATICAL MODELS; METALS; MICROMACHINING;

ELECTRIC POTENTIAL; ELECTROCHEMICAL MICROMACHINING; MASK WALL ANGLE; OHMIC CONTROL; SHAPE EVOLUTION;

ELECTROCHEMICAL CUTTING;

EID: 0030082323     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836477     Document Type: Article

References (13)

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