Issues of wet cleaning in U LSI process

IEICE Transactions on Electronics

Volumn E79-C, Issue 3, 1996, Pages 337-342

  Ajioka, Tsuneo ^a   Shibata, Mayumi ^a   Mizokami, Yasuo ^a  

^a Oki Engineering Co Ltd   (Japan)

Author keywords

Lifetime; Metallic contamination; Particle; Wet cleaning

Indexed keywords

CLEANING; CONTAMINATION; DECONTAMINATION; DRYING; IMPURITIES; METALS; SILICON WAFERS; ULSI CIRCUITS;

METALLIC CONTAMINATION; PARTICLE REDUCTION; WET CLEANING;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0030107659     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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