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Volumn 42, Issue 3, 1995, Pages 497-505

High Speed Submicron BiCMOS Memory

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR TRANSISTORS; BUFFER STORAGE; CMOS INTEGRATED CIRCUITS; GATES (TRANSISTOR); LOGIC GATES; RELIABILITY; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR STORAGE;

EID: 0029271518     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.368046     Document Type: Article
Times cited : (8)

References (34)
  • 5
    • 0024088598 scopus 로고
    • A 12 ns ECL I/O 256 K × 1 bit SRAM using a 1 µm BiCMOS technology, ’
    • Oct.
    • R. A. Kertis, D. D. Smith and T. L. Bowman, “A 12 ns ECL I/O 256 K × 1 bit SRAM using a 1 µm BiCMOS technology,’ IEEE J. Solid-State Circuits, vol. 23, pp. 1048–1053, Oct. 1988.
    • (1988) IEEE J. Solid-State Circuits , vol.23 , pp. 1048-1053
    • Kertis, R.A.1    Smith, D.D.2    Bowman, T.L.3
  • 18
    • 84915816729 scopus 로고
    • A 1.5 ns 256 Kb BiCMOS SRAM with 11 K 60 ps logic gates
    • N. Tamba et al., “A 1.5 ns 256 Kb BiCMOS SRAM with 11 K 60 ps logic gates,” in ISSCC Dig. Tech. Papers, pp. 246-247, 1993.
    • (1993) ISSCC Dig. Tech. Papers , pp. 246-247
    • Tamba, N.1
  • 20
    • 0025507858 scopus 로고
    • A 23-ns 1-Mb BiCMOS DRAM
    • Oct.
    • G. Kitsukawa et al. “A 23-ns 1-Mb BiCMOS DRAM.” IEEE J. Solid-State Circuits, vol. 25, pp. 1102–1111, Oct. 1990.
    • (1990) IEEE J. Solid-State Circuits , vol.25 , pp. 1102-1111
    • Kitsukawa, G.1
  • 22
  • 25
    • 84930094279 scopus 로고    scopus 로고
    • Tailoring interfacial oxide for polysilicon bit-cell contacts and emitters with In Situ vapor HF interface cleaning and polysilicon deposition in a 4 Mbit BiCMOS fast static RAM
    • F. Walczyk, C. Lage, V. Kaushik and M. Blackwell, “Tailoring interfacial oxide for polysilicon bit-cell contacts and emitters with In Situ vapor HF interface cleaning and polysilicon deposition in a 4 Mbit BiCMOS fast static RAM,” in Proc. IEEE 1992 Bipolar/BiCMOS Circuits and Technology Meeting, pp. 84–87.
    • Proc. IEEE 1992 Bipolar/BiCMOS Circuits and Technology Meeting , pp. 84-87
    • Walczyk, F.1    Lage, C.2    Kaushik, V.3    Blackwell, M.4
  • 26
    • 0027611070 scopus 로고
    • Integration of a double-polysilicon emitter-base self-aligned bipolar transistor into a 0.5-µm BiCMOS technology for Fast 4-Mb SRAM's
    • June
    • J. D. Hayden, J. D. Burnett, A. H. Perera, T. C. Mele, F. W. Walczyk, V. Kaushik, C. S. Lage and Y. C. See. “Integration of a double-polysilicon emitter-base self-aligned bipolar transistor into a 0.5-µm BiCMOS technology for Fast 4-Mb SRAM's,” IEEE Trans. Electron Devices, vol. 40, pp. 1121–1128, June 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 1121-1128
    • Hayden, J.D.1    Burnett, J.D.2    Perera, A.H.3    Mele, T.C.4    Walczyk, F.W.5    Kaushik, V.6    Lage, C.S.7    See, Y.C.8
  • 30
    • 0022733111 scopus 로고
    • Influences on soft error rates in static RAM's
    • June
    • P. M. Cater and B. R. Wilkins, “Influences on soft error rates in static RAM's,” IEEE J. Solid-State Circuits, vol. SC-22, pp. 430–436, June 1987.
    • (1987) IEEE J. Solid-State Circuits , vol.SC-22 , pp. 430-436
    • Cater, P.M.1    Wilkins, B.R.2
  • 31
    • 0026142390 scopus 로고
    • Fast-access BiCMOS SRAM architecture with a Vss generator
    • Apr.
    • T. Douseki, Y. Ohmori, H. Yoshino and J. Yamada, “Fast-access BiCMOS SRAM architecture with a Vss generator,” IEEE J. Solid-State Circuits, vol. 26, p. 513–517, Apr. 1991.
    • (1991) IEEE J. Solid-State Circuits , vol.26 , pp. 513-517
    • Douseki, T.1    Ohmori, Y.2    Yoshino, H.3    Yamada, J.4
  • 32
    • 0027259531 scopus 로고
    • Soft-error-rate improvement in advanced BiCMOS SRAM's
    • D. Burnett et al., “Soft-error-rate improvement in advanced BiCMOS SRAM's,” in IEEE IRPS Proceedings, pp. 156–160, 1993.
    • (1993) IEEE IRPS Proceedings , pp. 156-160
    • Burnett, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.