Characterization of Positive Photoresist

IEEE Transactions on Electron Devices

Volumn 22, Issue 7, 1975, Pages 445-452

  Dill, Frederick H ^a   Hornberger, William P ^a   Hauge, Peter S ^a   Shaw, Jane M ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - OPTICAL PROPERTIES;

PHOTORESISTS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0016526028     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1975.18159     Document Type: Article

References (7)

1. W. P. Hornberger, P. S. Hauge, J. M. Shaw, and F. H. Dill, “The characterization of positive photoresists,” Proc. Kodak Microelectronics Seminar, San Diego, Calif., Oct. 1974.
2. W. Neugebauer et al., “Etchable reproduction coatings on metal supports,” U. S. Patent 3 201 239.
3. A. R. Neureuther and F. H. Dill, “Photoresist modeling and device fabrication applications,” Proc. Microwave Research Institute Symp., Brooklyn, Apr. 1974.
4. F. H. Dill, J. A. Tuttle, and A. R. Neureuther, “Modeling positive photoresist,” Proc. Kodak Microelectronics Seminar, San Diego, Calif., Oct. 1974.
5. C. E. Herrick, J r., “Solution of the partial differential equations describing photodecomposition in a light-absorbing matrix having light-absorbing photoproducts,” IBM J. Res. Develop., vol. 10, pp. 2-5, Jan. 1966.
6. M. Schaule, private communication.
7. K. L. Konnerth and F. H. Dill, “IOTA: A new computer controlled thin film thickness measurement tool,” Solid-State Electron., vol. 15, pp. 371-380, 1972.