Fabrication of micro conical array for antireflection structured surface using a metal dot pattern

Optics InfoBase Conference Papers

Volumn , Issue , 2000, Pages 126-128

  Toyota, H ^a   Takahara, K ^a   Okano, M ^a   Yotsuya, T ^b   Kikuta, H ^a  

^a OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

^b Osaka Metropolitan University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; FUSED SILICA; INCIDENT LIGHT;

ANTIREFLECTION; DOT PATTERNS; ELECTRON BEAM WRITING; FLUOROCARBON PLASMA; FUSED SILICA SUBSTRATES; GRATING PERIODS; LIFT-OFF PROCESS; REACTIVE-ION ETCHING; STRUCTURED SURFACES; TWO-DIMENSIONAL;

REACTIVE ION ETCHING;

EID: 0141548337     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. Y. Kanamori, M. Sasaki and K. Hane, "Boardband antireflection gratings fabricated upon silicon substrates", Opt. Lett. 24, 1422-1424 (1999).
2. R. C. Enger and S. K. Case, "Optical elements with ultrahigh spatial-frequency surface corrugations", Appl. Opt. 22, 3220-3228 (1983).
3. D. L. Brundrett, T. K. Gaylord and E. N. Glytsis, "Polarizing mirror/absorber for visible wavelength based on a silicon subwavelength grating: design and fabrication", Appl. Opt. 37, 2534-2541 (1998).
4. D. H. Raguin and G. M. Morris, "Antireflection structured surfaces for the infrared spectral region", Appl. Opt. 32, 1154-1167 (1993).
5. D. H. Raguin and G. M. Morris, "Analysis of antireflection-structured surfaces with continuous one-dimensional surface profiles", Appl. Opt. 32, 2582-2598 (1993).