Nitrogen transport during rapid thermal growth of silicon oxynitride films in N2O

Applied Physics Letters

Volumn 69, Issue 16, 1996, Pages 2385-2387

  Baumvol, I J R ^a   Stedile, F C ^a   Ganem, J J ^b   Trimaille, I ^b   Rigo, S ^b  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013222287     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117645     Document Type: Article

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