14N depth distribution measurements for ultrathin dielectric films on silicon (100)

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 108, Issue 3, 1996, Pages 347-353

  Tang, H T ^a   Lennard, W N ^a   Feldman, L C ^b   Green, M L ^b   Brasen, D ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039469657     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)01059-9     Document Type: Article

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