Sub-nm figure error correction of an extreme ultraviolet multilayer mirror by its surface milling

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 467-468, Issue PART II, 2001, Pages 1282-1285

  Yamamoto, Masaki ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Extreme ultraviolet; Figure error correction; Multilayer; Projection lithography; Reflection phase

Indexed keywords

ERROR CORRECTION; MILLING (MACHINING); MIRRORS; MULTILAYERS; PHOTOLITHOGRAPHY;

ACCURATE CORRECTION; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET MULTILAYERS; FIGURE ERROR; MO/SI MULTILAYER; PROJECTION LITHOGRAPHY; REFLECTION PHASE; SURFACE MILLING;

OPTICAL MULTILAYERS;

EID: 0013005204     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(01)00640-4     Document Type: Article

References (7)

1. H. Kinoshita, K. Kurihara, Y. Ishii, Y. Torii, J. Vac. Sci. Technol. B 7 (1989) 1648.
2. C. Gwyn, R. Stulen, D. Sweeney, D. Attwood, J. Vac. Sci. Technol. B 16 (1998) 3142.
3. R. Stuik, E. Louis, A.E. Yakshin, P.C. Gorts, E.L.G. Maas, F. Bijkerk, D. Schmitz, F. Scholze, G. Ulm, M. Haidl, J. Vac. Sci. Technol. B 17 (1999) 2998.
4. J. Braat, in: G.D. Kubiak, D. Kania (Eds.), Proceedings of the OSA TOPS on EUVL, OSA, 1996, p. 152.
5. M. Yamamoto, T. Namioka, Appl. Opt. 31 (1992) 1622.
6. P.H. Berning, Theory and calculation of optical thin films, in: J. Hass (Ed.), Physics of Thin Films, Academic Press, New York, 1963, p. 100 (Eq. (140)).
7. http://www-cxro.lbl.gov/optical-constants/.