Coupled-flux nucleation modeling of oxygen precipitation in silicon

Journal of Applied Physics

Volumn 88, Issue 9, 2000, Pages 5062-5070

  Wei, P F ^a   Kelton, K F ^a   Falster, R ^b  

^a WASHINGTON UNIVERSITY   (United States)

^b MEMC Electronic Materials SpA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012294610     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1311309     Document Type: Article

References (20)

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