Pressure dependence of Si/SiO2 degradation suppression by helium

Journal of Applied Physics

Volumn 87, Issue 10, 2000, Pages 7338-7341

  Afanas'ev, V V ^a   Stesmans, A ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012068445     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372990     Document Type: Article

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