The microstructure of Cu films deposited by the self-ion assisted technique

Journal of Electronic Materials

Volumn 31, Issue 1, 2002, Pages 40-44

  Field, D P ^a   Kononenko, O V ^b   Matveev, V N ^b  

^a Washington State University   (United States)

^b INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

Abnormal grain growth; Crystallographic texture; Cu thin films; Electron backscatter diffraction

Indexed keywords

COPPER COMPOUNDS; DEPOSITION; GRAIN GROWTH; GRAIN SIZE AND SHAPE; ION BEAMS; MICROSTRUCTURE;

ABNORMAL GRAIN GROWTH; CRYSTALLOGRAPHIC TEXTURE; CU THIN FILMS; ELECTRON BACKSCATTER DIFFRACTION;

THIN FILMS;

EID: 0012051370     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-002-0170-z     Document Type: Article

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