Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry

Pure and Applied Chemistry

Volumn 70, Issue 6, 1998, Pages 1151-1156

  Swinkels, G H P M ^a   Stoffels, E ^a   Stoffels, W W ^a   Simons, N ^a   Kroesen, G M W ^a   De Hoog, F J ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012651036     PISSN: 00334545     EISSN: None     Source Type: Journal    
DOI: 10.1351/pac199870061151     Document Type: Article

References (11)

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