Electromigration drift velocity in Cu interconnects modeled with the level set method

Applied Physics Letters

Volumn 77, Issue 21, 2000, Pages 3355-3357

  Nathan, M ^a   Glickman, E ^a   Khenner, M ^a   Averbuch, A ^a   Israeli, M ^b  

^a TEL AVIV UNIVERSITY   (Israel)

^b TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011704584     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1327274     Document Type: Article

References (12)

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5. J. A. Sethian, Level Set Methods (Cambridge University Press, Cambridge, 1996).
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12. M. Nathan, K. Glickman, M. Khenner, and A. Averbuch (unpublished).