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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1617-1622

Wet oxidation behaviors of polycrystalline [formula omitted] films

(9) Kang, S K a ko, D H a Lee, K C b Lee, T W b Lee, Y H b Ahn, T H c Yeo, I S c oh, S H d Park, C G d

a Yonsei University (South Korea)

b Ju Sung Engineering Co Ltd (South Korea)

c Hynix Semiconductor Inc (South Korea)

d Pohang University of Science and Technology (POSTECH) (South Korea)

Author keywords

(Si,Ge)

Indexed keywords

EID: 0011694806 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.1339022 Document Type: Conference Paper

Times cited : (7)

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