Nitrogen delta doping in 6H silicon carbide layers

Journal of Applied Physics

Volumn 89, Issue 3, 2001, Pages 1794-1799

  Yokogawa, Toshiya ^a   Takahashi, Kunimasa ^a   Uenoyama, Takeshi ^a   Kusumoto, Osamu ^a   Uchida, Masao ^a   Kitabatake, Makoto ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011632571     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1337937     Document Type: Article

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