Properties of germanium-doped indium oxide thin films prepared by DC magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 4 A, 2000, Pages 1849-1854

  Mizuno, Masao ^a   Miyamoto, Takashi ^a  

^a KOBE STEEL LTD   (Japan)

Author keywords

Amorphous; Electrical conductivity; Etching rate; Germanium; Indium oxide; ITO

Indexed keywords

EID: 0011402254     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.1849     Document Type: Article

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