Bevel etching of tin-doped indium oxide

Journal of the Electrochemical Society

Volumn 143, Issue 2, 1996, Pages

  Van Den Meerakker, J E A M ^a   Jacobs, J W M ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b Flat Panel Display Company BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; ELECTROLYTIC CELLS; ETCHING; INDIUM COMPOUNDS; LIQUID CRYSTAL DISPLAYS; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SPUTTER DEPOSITION; TIN;

HYDROCHLORIC IRON CHLORIDE SOLUTIONS; INDIUM TIN OXIDE; SATURATED CALOMEL ELECTRODE; WET CHEMICAL ETCHING;

OXIDES;

EID: 0030081818     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836451     Document Type: Article

References (6)

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2. W. Kern, J. L. Vossen, and G. L. Schnable, Reliability Physics Annual Proceedings, 11, 214 (1973).
3. J. J. Kelly and G. J. Koel, This Journal, 125, 860 (1978).
4. J. E. A. M. van den Meerakker, R C. Baarslag, and M. Scholten, ibid., 142, 2321 (1995).
5. J. J. Kelly and C. H. de Minjer, ibid., 122, 931 (1975).
6. P H. L. Notten, J. E. A. M. van den Meerakker, and J. J. Kelly, Etching of III-V Semiconductors: An Electrochemical Approach, pp., 321-324, Elsevier Advanced Technology Series, Oxford (1991).