Characterization of spatial coherence uniformity in exposure tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 289-296

  Grodnensky, Ilya M ^a   Morita, Etsuya ^a   Suwa, Kyoichi ^b   Hirukawa, Shigeru ^b  

^a NIKON PRECISION INC   (United States)

^b NIKON CORPORATION   (Japan)

Author keywords

Aberrations; Linewidth variation; Optical lithography; Spatial partial coherence; Wedge shaped mark

Indexed keywords

ABERRATIONS; COHERENT LIGHT; COMPUTER SOFTWARE; DIAMONDS; EXPOSURE METERS; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; SCANNING;

EXPOSURE TOOLS; FOCUS DETECTION; HIGH ACCURACY; HIGH SENSITIVITY (HS); IMAGE FIELDS; LASER SCANNING; LINEWIDTH VARIATION; OPTICAL LITHOGRAPHY; PROJECTION LENSES; SEM MEASUREMENTS; SOFTWARE MODIFICATIONS; SPATIAL PARTIAL COHERENCE; WEDGE SHAPED MARK;

SENSITIVITY ANALYSIS;

EID: 0011245763     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310758     Document Type: Conference Paper

References (6)

1. J. Borodovsky, "Impact of local partial coherence variations on exposure tool performance", Optical/Laser Microlithography, Proc. SPIE, Vol. 2440, pp. 750-770 , 1995
2. C. Progler, H. Du, G. Wells, "Potential causes of across field CD variation", Optical/Laser Microlithography, Proc. SPIE, Vol. 3051, pp. 660-671, 1997
3. G. P. Watson, R. A. Cirelli, M. Mkrtchyan, "Characterizing partial coherence uniformity in a deep ultraviolet step and repeat tool", J. Vac. Sci. Technol. B 15(6), pp. 2399-2403, 1997
4. J. P. Kirk, "Pupil illumination: in-situ measurement of partial coherence", Optical/Laser Microlithography, Proc. SPIE, Vol. 3334, 1998
5. I. Grodnensky, G. P. Watson, J. Garofalo, D. Castro, L. Zych, W. Lee, "Towards 280 nm i-line random logic lithography with off-axis illumination and optical proximity correction", J. Vac. Sci. Technol. B 15(6), pp. 2422-2425, 1997
6. K. Suwa, H. Tateno, N. Irie, S. Hirukawa, "Automatic laser scanning focus detection method using printed focus pattern", Optical/Laser Microlithography, Proc. SPIE, Vol. 2440, pp. 712-720, 1995