Towards 280 nm i-line random logic lithography with off-axis illumination and optical proximity correction

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2422-2425

  Grodnensky, I ^a   Watson, G P ^b   Garofalo, J ^b   Castro, D ^a   Zych, L ^a   Lee, W ^a  

^a NIKON PRECISION INC   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143106974     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589659     Document Type: Article

References (4)

1. J. Garofalo, C. Biddick, R. Kostelak, and S. Vaidya, J. Vac. Sci. Technol. B 11, 2651 (1993).
2. R. Pforr, A. Wrong, K. Ronse, L. Van der hove, A. Yen, S. Palmer, G. Fuller, and O. Otto, SPIE Optical Laser Microlithography VIII, edited by T. Brunner (SPIE, Bellingham, WA, 1995), Vol. 2440, p. 150.
3. J. Garofalo, O. Otto, R. Cirelli, R. Kostelak, and S. Vaidya, SPIE Optical Laser Microlithography VIII, edited by T. Brunner (SPIE, Bellingham, WA, 1995), Vol. 2440, p. 302.
4. J. Garofalo, G. P. Watson, L. Trimble, R. Cirelli, A. Colina, I. Grodnensky, B. Herrero, A. Dunbar, F. Peiffer, R. Takahashi, R. Tarascon, W. Yarbrough, and L. Zych, 16th Annual Symposium on Photomask Technology and Management (SPIE, Bellingham, WA, 1996), Vol. 2884, p. 311.