SEM-EDX and SAM-AES Investigations on Rochow Contact Masses

Applied Organometallic Chemistry

Volumn 11, Issue 3, 1997, Pages 237-247

  Ehrich, H ^a   Born, D ^b   Richter, K ^c   Richter Mendau, J ^a   Lieske, H ^a  

^a LEIBNIZ INSTITUT FÜR KATALYSE E V AN DER UNIVERSITÄT ROSTOCK   (Germany)

^b HUMBOLDT UNIVERSITY   (Germany)

^c Inst of Environmental Technologies   (Germany)

Author keywords

Auger electron spectroscopy (AES); Copper silicides; Energy dispersive X ray spectroscopy (EDX); Promoters; Rochow reaction; Scanning Auger microscopy (SAM); Scanning electron microscopy (SEM); Cu3Si

Indexed keywords

EID: 0000057968     PISSN: 02682605     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0739(199703)11:3<237::AID-AOC557>3.0.CO;2-4     Document Type: Article

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