Revalidation of the Rayleigh resolution and DOF limits

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 142-153

  Smith, Bruce W ^a  

^a Kate Gleason College of Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY;

CURRENT TECHNOLOGIES; DEPTH-OF-FOCUS (DOF); DIFFRACTION ORDERS; FUNDAMENTAL LIMITATIONS; OPTICAL IMAGING; PARTIAL-COHERENCE; RAYLEIGH; REVALIDATION; UNIVERSAL EQUATIONS;

OUTSOURCING;

EID: 30644471484     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310744     Document Type: Conference Paper

References (3)

1. Lord Rayleigh, Phil. Mag., (5), 8, 403 (1879).
2. B.W. Smith, Microlithography: Science and Technology, Chapter 3: Optics for Photolithography, J.R. Sheats, B.W. Smith ed., New York: Marcel Dekker, 1998.
3. Prolith/2 v.5 scalar model.