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Volumn 3050, Issue , 1997, Pages 545-556

Advanced FTIR techniques for photoresist process characterization

Author keywords

DUV; FTIR; Glass transition temperature measurement; i line; Reaction kinetics; Resist; Thickness measurement

Indexed keywords

ACCESSORIES; AMPLIFICATION; ASSOCIATION REACTIONS; ELECTRON BEAM LITHOGRAPHY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; FREE RADICAL POLYMERIZATION; GLASS; MEASUREMENTS; PHOTORESISTORS; PHOTORESISTS; PROCESS CONTROL; REACTION KINETICS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; SPECTRUM ANALYZERS; SUPERCONDUCTING TRANSITION TEMPERATURE; SURFACE TREATMENT; TEMPERATURE MEASUREMENT; THICKNESS GAGES; THICKNESS MEASUREMENT;

EID: 0010363842     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275946     Document Type: Conference Paper
Times cited : (4)

References (14)
  • 5
    • 62249117751 scopus 로고    scopus 로고
    • SCOUT: SpectrosCopic Objects and UTilities, a Windows-based program for optical analysis, written by one of the authors W.Theiss
    • SCOUT: SpectrosCopic Objects and UTilities, a Windows-based program for optical analysis, written by one of the authors (W.Theiss).
  • 9
    • 0342779670 scopus 로고    scopus 로고
    • c. A. Mack, D. P. DeWitt, B. K. Tsai, and G. Yetter, Proc. SPIE 2195, 584-595 (1994).
    • c. A. Mack, D. P. DeWitt, B. K. Tsai, and G. Yetter, Proc. SPIE 2195, 584-595 (1994).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.