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Volumn 3050, Issue , 1997, Pages 545-556
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Advanced FTIR techniques for photoresist process characterization
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Author keywords
DUV; FTIR; Glass transition temperature measurement; i line; Reaction kinetics; Resist; Thickness measurement
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Indexed keywords
ACCESSORIES;
AMPLIFICATION;
ASSOCIATION REACTIONS;
ELECTRON BEAM LITHOGRAPHY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
FREE RADICAL POLYMERIZATION;
GLASS;
MEASUREMENTS;
PHOTORESISTORS;
PHOTORESISTS;
PROCESS CONTROL;
REACTION KINETICS;
SPECTROSCOPIC ANALYSIS;
SPECTROSCOPIC ELLIPSOMETRY;
SPECTRUM ANALYZERS;
SUPERCONDUCTING TRANSITION TEMPERATURE;
SURFACE TREATMENT;
TEMPERATURE MEASUREMENT;
THICKNESS GAGES;
THICKNESS MEASUREMENT;
DUV;
FTIR;
GLASS TRANSITION TEMPERATURE MEASUREMENT;
I-LINE;
RESIST;
GLASS TRANSITION;
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EID: 0010363842
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.275946 Document Type: Conference Paper |
Times cited : (4)
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References (14)
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