Magnetic characteristics of Fe–N films prepared by reactive ion beam sputtering with a nitrogen bombardment process

Journal of Applied Physics

Volumn 87, Issue 9, 2000, Pages 5245-5247

  Iwatsubo, S ^a   Naoe, M ^a  

^a TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009947168     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.373309     Document Type: Conference Paper

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