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Volumn 2000-January, Issue , 2000, Pages 292-296

The reliability performance of low cost bumping on aluminum and copper wafer

Author keywords

Aluminum; Copper; Costs; Gold; Lithography; Sputter etching; Sputtering; Temperature; Testing; Throughput

Indexed keywords

CHIP SCALE PACKAGES; COPPER; COSTS; ELECTRONICS PACKAGING; ETCHING; FLIP CHIP DEVICES; GOLD; HIGH TEMPERATURE APPLICATIONS; LITHOGRAPHY; NICKEL; PHOTOLITHOGRAPHY; RELIABILITY; SILICON WAFERS; SOLDERING ALLOYS; SPUTTERING; TEMPERATURE; TESTING; THROUGHPUT;

EID: 0009583443     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EPTC.2000.906389     Document Type: Conference Paper
Times cited : (16)

References (7)
  • 1
    • 0345757739 scopus 로고
    • Application of Electroless Ni Plating in The Semiconductor Microcircuit Industry
    • July
    • K. Wong, K. Chi, and A. Rangappan, "Application of Electroless Ni Plating in The Semiconductor Microcircuit Industry", Plat. Surf. Finish., pp.706, July 1988.
    • (1988) Plat. Surf. Finish. , pp. 706
    • Wong, K.1    Chi, K.2    Rangappan, A.3
  • 2
    • 0027132112 scopus 로고
    • The Pre-treatment of Al Bondpads for Electroless Nickel Bumping
    • Santa Cruz, CA
    • A. Ostmann, J.Simon, and H. Reichl, "The Pre-treatment of Al Bondpads for Electroless Nickel Bumping", Proc. IEEE MCM Conf., Santa Cruz, CA, 1993, pp 748.
    • (1993) Proc. IEEE MCM Conf. , pp. 748
    • Ostmann, A.1    Simon, J.2    Reichl, H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.