Low-temperature growth of SiCalN films of high hardness on Si(111) substrates

Applied Physics Letters

Volumn 79, Issue 18, 2001, Pages 2880-2882

  Roucka, Radek ^a   Tolle, John ^a   Smith, David J ^a   Crozier, Peter ^a   Tsong, I S T ^a   Kouvetakis, John ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

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[No Author keywords available]

Indexed keywords

EID: 0009543296     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1413723     Document Type: Article

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