Low-frequency noise measurement of copper damascene interconnects

Proceedings of the IEEE 2000 International Interconnect Technology Conference, IITC 2000

Volumn , Issue , 2000, Pages 152-154

  Koh, L T ^a,b   Chu, L W ^b   Pey, K L ^b   Chim, W K ^b  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC NOISE MEASUREMENT; COPPER; MICROSTRIP LINES; SILICON NITRIDE; SILICON OXIDES; SILICON WAFERS; SPURIOUS SIGNAL NOISE;

COPPER DAMASCENE INTERCONNECTS; FORMATION-OF-COPPER OXIDES; HIGH CURRENT DENSITIES; LOW-FREQUENCY NOISE MEASUREMENTS; RESISTANCE MEASUREMENT; STATE OF THE ART; TEST STRUCTURE; VOID FORMATION;

INTEGRATED CIRCUIT INTERCONNECTS;

EID: 0009010512     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IITC.2000.854309     Document Type: Conference Paper

References (4)

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4. F.N. Hooge, "1/f noise", Physica, vol. 83B, p. 14, 1976.