Performance of a new high-NA scanned-laser mask lithography system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 42-54

  Hamaker, H Christopher ^a   Buck, Peter D ^a  

^a Etec Systems Inc   (United States)

Author keywords

Pattern generation; Photomask; Print quality; Reticle writer; Throughput

Indexed keywords

AERIAL IMAGES; CD LINEARITIES; CRITICAL DIMENSIONS; DOSE ADJUSTMENTS; DRY ETCH PROCESSES; ETCH BIASES; HIGH THROUGHPUTS; LASER MASKS; LASER PRODUCTS; LITHOGRAPHY SYSTEMS; M DESIGNS; NEW GENERATIONS; OPTIMAL PERFORMANCES; PATTERN GENERATION; PEAK PRODUCTIONS; PRINT QUALITY; RETICLE WRITER; SPOT SIZES;

DATA STORAGE EQUIPMENT; DRY ETCHING; IMAGE QUALITY; INTEGRATED CIRCUITS; LASERS; OPTICAL INSTRUMENTS; PHOTORESISTS; PRINTING PRESSES;

PHOTOMASKS;

EID: 0006750477     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.301205     Document Type: Conference Paper

References (5)

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2. th Annual BACUS Symposium on Photomask Technology and Management, Gilbert V. Sheldon and James N. Wiley, Editors, Proc. SPIE 2621, 319-328 (1995).
3. H. Kobayashi, et al., "Photomask blanks enhancement for the laser reticle writer," Photomask and X-Ray Mask Technology II, Proc., Proceedings of SPIE Vol. 2512, (1995).
4. P. Buck and R. Holmström, "Post apply bake optimization for 6025 masks," Photomask and X-Ray Mask Technology IV, Proc., Naoki Aisaki, Editor, Proceedings of SPIE Vol. 3096, 61-65 (1997).
5. C. Constantine, D. J. Johnson, R. J. Westerman, and T. P. Coleman, "Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions," Photomask and X-Ray Mask Technology IV, Proc., Naoki Aisaki, Editor, Proceedings of SPIE Vol. 3096, 11-18 (1997).