Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 11-18

  Constantine, Chris ^a   Johnson, David J ^a   Westerman, R J ^a   Coleman, Thomas P ^a   Faure, Tom ^a  

^a Qualtx Technology Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; ETCHING; PHOTOLITHOGRAPHY; PLASMA DEVICES; PROXIMITY SENSORS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY;

CRITICAL DIMENSIONS; OPTICAL PROXIMITY CORRECTION;

MASKS;

EID: 0031363447     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277267     Document Type: Conference Paper

References (1)