Post apply bake optimization for 6025 masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 61-65

  Buck, Peter D ^a   Holmstrom, Robert A ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HEATING; OPTIMIZATION; PERFORMANCE; PHOTOLITHOGRAPHY;

CRITICAL DIMENSIONS; POST APPLY BAKE;

MASKS;

EID: 0031369723     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277273     Document Type: Conference Paper

References (4)