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Volumn 88, Issue 11, 2000, Pages 6364-6368

Structural analysis of interfacial layers in Ti/Ta/Al ohmic contacts to n-AlGaN

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0006409658     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1323517     Document Type: Article
Times cited : (17)

References (13)
  • 13
    • 0004120995 scopus 로고    scopus 로고
    • Springer, Tokyo
    • D. Shindo and K. Hiraga, High-Resolution Electron Microscopy for Materials Science (Springer, Tokyo, 1998); Generally, in a digital diffractogram of a high-resolution image, the noise on the image forms a monotonic background with no sharp peaks. Thus, by selecting diffraction spots on a digital diffractogram and carrying out the inverse Fourier transform, this noise may be removed.
    • (1998) High-Resolution Electron Microscopy for Materials Science
    • Shindo, D.1    Hiraga, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.